Grace Hsiu-Ying Ho*, Hung-Miao Lin, Chen-Yu Yeh,2018,Photo-electron chemistry of photoresist outgassing upon DUV, VUV, EUV and BEUV irradiation,Journal of Photochemistry and Photobiology A: Chemistry,353,pp306-315 (SCI)
| 學年度 | 2018 |
|---|---|
| 期刊等級 | SCI |
| 論文名稱(篇名) | Photo-electron chemistry of photoresist outgassing upon DUV, VUV, EUV and BEUV irradiation |
| 期刊名 | Journal of Photochemistry and Photobiology A: Chemistry |
| 出版日期 | 2018-02-15 |
| 卷數 | 353 |
| 起頁 | 306 |
| 迄頁 | 315 |
| 全部作者 | Grace Hsiu-Ying Ho*, Hung-Miao Lin, Chen-Yu Yeh |
| 著作人數 | 3 |
| 作者型態 | First Author |
| 所屬計畫案 | NSC 100–2120-M-009-010, 101–2120-M-009-007 and 102–2622-M-390-001-CC2 |
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